examples of CYRANNUS® applications
activation diamond deposition plasma chemistry etching
activation
Operating at a medium pressure range CYRANNUS® plasma sources deliver high quality surface activations within seconds. This implies high surface energies (> 70 dyn/cm) and homogeneous activitation of three-dimensional components as well.
Treatment of textiles using CYRANNUS® plasma gains from simple requirements for plasma generation. Innovative medium pressure processes are able to use the natural humidity of fabrics for the treatment process. The resulting activation is high and requires only a relatively small amount of process gas.
plasma treated untreated fabrics
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diamond deposition
The size of the plasma generated is a crucial factor for the economies of diamond deposition. The CYRANNUS® plasma concept is scalable both, in diameter and volume. Thus conventional systems are notably outperformed. The recently presented 16" CYRANNUS® plasma source is only the smallest possible application of the 915 MHz technology.
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plasma chemistry
Plasma processes with good spatial uniformity are ideal for plasma-chemical reactions in gas flows. That can be for example the cracking of hazardous organic molecules into small and harmless compounds.
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etching
Removal of residuals in drilling holes ("desmearing") can be done in in-line processes within less than 30 seconds per sheet. Lever for high process speed is the operation of plasma at medium pressure.
before treatment plasma treated
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Please note that you can find more details on CYRANNUS® applications in the download area.