The EH-tuner is a tuning element for CYRANNUS^® plasma sources and other microwave applications. Tuning of microwave power is required because impedance is influenced by various parameters of plasma source and plasma properties. Generally it can be said that changes in process conditions require tuning.

					applications: precise impedance adjustment minimization of reflected microwave power lower losses in process and tuning device
					technical specifications: length: 173mm height: 510mm width: 590mm R26 flanges indicators for plunger positions
			EH-tuner, automatic version

There are different tuning modes available:

• manual mode: manual movement of plungers, saving of one special plunger position, e.g. ignition position
• semi-automatic mode: call the saved plunger position, automatic minimization of reflected power, stop all movements
• fully automatic mode: controlling of all tuner features via PLC

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KF - bulkhead union

KF - bulkhead union for reliable feedthrough of vacuum pipelines through subplates and partitions. All KF - bulkhead unions are equipped with seals to caulk the drill hole after mounting the KF - bulkhead union.

KF - bulkhead unions are available in different sizes:

	DN16	DN25	DN40
nominal size	16mm	.25mm	40mm
max. terminal length	13mm	.	6mm
complete length	75mm	75mm	88mm
mounting thread	G 1 1/4"	G 1 1/2"	G 2"
mounting bore hole	42,5mm	48,5mm	60mm
material	aluminium/stainless steel*	aluminium/stainless steel*	aluminium/stainless steel*
sealing	NBR / Viton*	NBR / Viton*	NBR / Viton*
nut	brass

*on request

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heated substrate holder

The substrate holder is well suited to mount flat substrates, e.g. wafers. It is designed to work in vacuum conditions within plasma systems. The materials used in this part of equipment are high-grade steel, molybdenum and ceramics. The circular design allows easy rotation of the substrate holder. A molybdenum plate carries the substrate. Ceramic rings guarantee electrical and thermal insulation from the rest of the holder.

		technical specifications: diameter of substrate: 4"/6"/8" temperature range: up to 900 oC number of zones: 1 - 3 thermal element: type K others on request power consumption: 2000 W

The substrate holder is warmed up by an integrated heater which is embedded in silicon nitride.The holder´s temperature is controlled automatically by a P/D-Controller. The temperature of the molybdenum plate is measured by a thermal element.

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bias electrode for manual operation

The bias electrode is equipped with a molybdenum tip. It is used for seeding purposes in the plasma chamber.

					The bias electrode is specially designed to fit to a CYRANNUS® I plasma source. The adaption to the upper flange of the source is done by a DN 40 KF-flange. Flanges with DN 40 KF precursor gas inlet that are already mounted can be modified in order to house the bias electrode. The positioning of the electrode within the plasma is done by a adjusting ring. The electrode is always grounded.
			The tip of the electrode can be changed easily

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