iplas plasma sources mikrowelle mikrowave

The CYRANNUS^® I plasma sources have a unique technical profile. The most striking property is that the generated plasma is homogeneous from lower pressure up to ambient pressure. These plasma sources show a very high degree of reliability. They can run for continuous operation at each pressure without any loss in quality. Plasma generation is possible with many different process gases, such as air, O₂, H₂, N₂, C_xH_y or Ar.
The illustration below shows a cut through a plasma source with microwave feed based on the CYRANNUS^® concept.

The source is feeded with microwave power from the right. From the magnetron, the waveguide is supported with microwave power through the launcher. It passes the circulator and the EH-tuner, before it is coupled into the plasma source. Depending on the impedance tuning, which is done by the EH-tuner, reflected power is lead back to the circulator, where it is absorbed in a water load.

The name CYRANNUS^® derives from CYlindrical Resonator with ANNUlar Slots because the functional principle of the source is based on a resonator with annular antennas.

The smallest version of the CYRANNUS^®I line is a reliable tool for streaming and analysis of gases.

The standard model of the CYRANNUS^®I line. Stable and reliable this model often proved itself in worldwide use. The combination of the pressure range and the enormous tolerance to varying process parameters makes this system that solid and robust.

Technical specifications:
frequency: 2,45 GHz
power required: 1 - 6 KW
plasma shape: sphere
plasma diameter: approx. 145 mm
pressure range: 0 - 1000 mbar

A bigger model of the CYRANNUS^®I line. A plasma diameter of approximately 25 cm makes this model feasible for the treatment of larger surfaces. This system often is used when the efficiency of a process has to be optimized.

Technical specifications:
frequency: 2,45 GHz
power required: 3 - 6 KW
plasma shape: discus
plasma diameter: ca. 250 mm
pressure range: 0 - 1000 mbar

This is so far the biggest CYRANNUS^®I source. With a plasma diameter of approximately 40 cm, this model is suitable for large surface applications. The change to the 915 MHz technology is the most economic way to approach a higer output and/or larger surfaces without a loss in quality.

This foto below shows the difference in size of the CYRANNUS^® I 6" compared to the 16" version. The scaling from 2,45 GHz to 915 MHz increases the size by a factor more than 2.5.

CYRANNUS^® II plasma sources produce a linear plasma. The plasma is formed like a tube around an inner cylinder. The special feature of the CYRANNUS^® II technology is the scalability in length. The system is optionally available for the medium pressure range and with an enhanced gas supply. The source shows a very good homogeneity of the plasma. This is made possible by a special concept of power coupling into the plasma via several antennas. The CYRANNUS^® II is designed for treatment of continuous materials such as webs, cloths or sheets.




		view into the vacuum chamber of CYRANNUS^® II

		linear plasma surrounding the quartz-glass-tube